Mentor Graphics Collaborates with GLOBALFOUNDRIES on Advanced Design and Manufacturing Flow Based on Calibre

WILSONVILLE, Ore — Mentor Graphics Corporation (NASDAQ: MENT) today announced that it is working with GLOBALFOUNDRIES to provide mutual customers with a reference flow that addresses the complex verification challenges of IC development at 28 nm and below. GLOBALFOUNDRIES’ proprietary Library of Yield Detractors Patterns and their innovative DRC+ physical verification flow are now implemented on Mentor’s Calibre® platform, which in addition to equation-based verification and comprehensive DFM, now includes pattern matching-based design rule checking capabilities for mutual customers, with support for GUI-based pattern creation and library management enabling custom rule development.

“By working closely with Mentor Graphics to combine our advanced foundry models and process data with Calibre’s signoff and DFM capabilities, GLOBALFOUNDRIES DRC+ flow provides our customers with the ability to more quickly release their design to fabrication,” said Andy Brotman, vice president of design infrastructure at GLOBALFOUNDRIES. “The new Calibre Pattern Matching product allows us to simplify the specification of advanced DRC and DFM rules, and improve the communication between designers and foundry personnel by moving from a text-based representation of yield-detracting geometries to a pattern-based one. As we all know from personal experience, a picture is worth a thousand words.”

“Our experience over multiple nodes in developing tools that represent the manufacturing process to designers has shown us that success depends on close cooperation among foundry, EDA vendor and design teams,” said Michael Buehler-Garcia, director of marketing for Calibre design-side products at Mentor Graphics. “DRC+ is based on collaboration that tunes our platform to GLOBALFOUNDRIES’ manufacturing process, making it easier and faster for designers to create market-winning ICs on the most advanced processes available.”